109 STAT. 1326 PROCLAMATION 6763—DEC. 23, 1994 Annex (con.) -277- Section A. (continiied) (335). Subheading 9017.20.80 is superseded by: •Drawing, Mrlcing-aut or nathemtical calculating instrtaients...:] [Other drawing, aarlcing-out or...:] "9 017. 20.5 0 P attern g ener atin g app aratu s designed to produce masks and reti cles frcm phot oresi st coated substrates (such as optical, E-beam, focused ion bean. X-ray or laser bean apparatus except those of subheading 8 45 6.9 0. 20) Free 4SX 90 17. 20. 90 Other [ Se e s ection Free (A, E,IL, J, 45X " D to this HX) Annex] 1.7X (CA) ( 3 3 6). Subhea dings 90 30.8 1.00 and 9030.89.00 are sup erseded by: [Osci llosco pes, spec trua a nal yzer s and other instruaents and apparatus for neasuring or...:] [Other instruments and apparatus:] "9030.81 With a recording device: 903 0.8 1.4 0 Instruaents and apparatus designed to neasure and checic sen)conductor wafers and de vices (su ch as p robe testers, resistivity checlcers, logic analyzers, autcnatic integrated circuit te ste rs) Free 40X 90 30. 81.8 0 Other [See section Free (A,B,C.E,IL, 40X D to this J,M X> Annex] 1.4X ((»k> 90 30.89 Other: 903 0. 89. 40 Instr uaents and appar atus designed to measure and check semiconductor wafers and devices (such as probe testers, resistivity checkers, logic a naly zers, a utcna tic integrated circuit testers) Free • 40X 9 030.89.80 Other [See section Free (A,6,C,E,IL, 40X" D to this J,MX) Annex] 1.4X (iM)
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