1212.6(C) Nation but No Date Provided 16
1212.6(D) Future Date of First Commercial Exploitation 16
1212.6(E) Applicant Left Space 6 Blank, but Completed Space 7 17
1212.7 Space 7: Citizenship or Domicile of Owner at the Time of First Commercial Exploitation 17
1212.8 Space 8: Nature of Contribution 17
1212.8(A) Description Indicates That the Mask Work Is "Original" or "Entirely New" 17
1212.8(B) Mask Work Is Based on or Incorporates a Preexisting Mask Work 17
1212.8(C) Description Limits the Claim with No Indication of Preexisting Material 18
1212.8(D) Description Clearly Presents a Claim in the Functions or Uses of the
Semiconductor Chip Product Embodying the Mask Work 18
1212.8(E) Description Contains Technical Terminology 18
1212.9 Space 9: Contact Person for Correspondence about the Claim 18
1212.10 Space 11: Certification 18
1212.10(A) Signature Required 18
1212.10(B) Dispersed Signature 19
1212.10(C) "Typed Signature" Space Hand Printed or Blank 19
1212.10(D) Certification Date 19
1212.11 Space 12: Mail Certification To 19
1213 Preparing the Deposit Material 19
1213.1 ID Material for Commercially Exploited Mask Works 20
1213.2 ID Material for Commercially Exploited Mask Works Containing Trade Secrets 20
1213.3 ID Material for Mask Works That Have Not Been Commercially Exploited:
Mask Work Contains More Than Twenty Percent of Intended Final Form 2 1
1213.4 Mask Works Not Commercially Exploited Containing Trade Secrets 21
1213.5 Mask Works Not Commercially Exploited: Mask Work Contains Less Than
Twenty Percent of Intended Final Form 21
1213.6 Special Relief from Deposit Requirements for Mask Works 22
1213.7 Deposit Retention 22
1214 Submitting the Application, Filing Fee, and Identifying Material 22
1215 Special Handling 23
1216 Correction or Amplification of a Completed Registration 23
1217 Reconsideration of Refusals to Register 23
Chapter 1200 : 3 12/22/2014
